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SW-BEAMER

Name:	SW-BEAMER
Location:	CEITEC Vysoké učení technické v Brně
Instrument description:	Beamer is a comprehensive software platform used for optimization of electron beam lithography process. It is possible to optimize the data pattern to significantly reduce the effects of various error sources such as beam positioning between shapes, filling shapes with "shots" on a discrete grid, field position dependent aberrations, stitching between fields, the spread of energy by electron scattering (proximity) and process effects.
Research group:	CF: CEITEC Nano

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