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Scanning Electron Microscope/E-beam writer TESCAN MIRA3

Name:	Scanning Electron Microscope/E-beam writer TESCAN MIRA3
Instrument:	Mira3 XMH
Technology / Methodology:	Probe microscopy & Nanomanipulation
Location:	CEITEC Vysoké učení technické v Brně
Instrument description:	SEM is a type of microscope where a focused beam of electrons is scanned over the sample to generate an image or to modify the sample surface in nanometric resolution (usually better than 10 nm). The sample image is generated by detecting secondary and backscattered electrons emitted from the impact location of the beam. The tool is preferred for e-beam lithography, where the resist-coated sample is selectively exposed to the electron beam, allowing the preparation of very small patterns (< 50 nm and less) in the resistant surface. There can be further processing of the sample by wet chemistry (development, stripping). An interferometric stage can also be used to achieve ultimate resolution of electron beam lithography over a large area and to join more fields together.
More information / Supplier:	http://cfnano.ceitec.cz/instrument.php?id=4
Research group:	CF: CEITEC Nano

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