Plasma Enhanced CVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100

Name:	Plasma Enhanced CVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100
Technology / Methodology:	Etching & Deposition
Location:	CEITEC Vysoké učení technické v Brně
Instrument description:	plasma enchanced chemical vapour deposition using chemically reactive plasma for deposition of silicon based materials
Research group:	CF: CEITEC Nano

If you would like to use this equipment contact the administrator:
First name:* Last name:* E-mail:* Phone:* Institution:* Purpose of reservation:*