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Lithographic wetbench

Name:	Lithographic wetbench
Technology / Methodology:	Nanolitography infrastructure
Location:	CEITEC Vysoké učení technické v Brně
Instrument description:	The RCD8 coat and develop platform can be custom tailored anywhere from e.g. a basic manual spin coater to a GYRSET® enhanced coater and puddle & spray developer tool. It can handle small pieces as well as standard wafers up to 200 mm and serves therefore ideally for daily R&D work up to small scale production.
Research group:	CF: CEITEC Nano

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