Abstract:
The ever-existing desire to get better, faster and smaller computers, generates an enormous drive for IC-technology. Computer chips must be more compact and thus composed out of smaller structures-units.
An essential production step in IC-technology is lithography: the writing of patterns on semi-conductor layers. However, the lithography light source that can generate fine structures must deliver radiation of small wavelengths and thus photons of high energy.
Nowadays most attention and efforts is paid to the design and construction of EUV lamps that can deliver 13.5 nm of radiation and thus photons of 92 eV. These hard photons are created in energetic plasmas; plasmas that might also generate turbulences and instabilities.
This lecture will not only address the fundamentals of these high temperature plasmas such as the dynamic behavior and the state of equilibrium-departure but also the practical problems that will arise upon application.
