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Ion beam etching Scia Systems Coat 200

Name:	Ion beam etching Scia Systems Coat 200
Technology / Methodology:	Etching & Deposition
Location:	CEITEC Vysoké učení technické v Brně
Instrument description:	physical vapor deposition method allows thin films to be etched by the use of broad beams of positively charged ions in a high vacuum system
Research group:	CF: CEITEC Nano

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