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A complex customized UHV equipment

Name:	A complex customized UHV equipment
Technology / Methodology:	In situ fabrication & Characterization
Location:	CEITEC Vysoké učení technické v Brně
Instrument description:	A complex UHV setup for fabrication of ultrathin films and nanostructures by PVD (MBE, magnetron sputtering,..) and their in situ analysis (RHEED UHV STM/AFM, NANOSAM, PEEM,…), fabrication and analysis of nanostructures under UHV conditions - wide-band gap semicionductors (GaN, InN, AlN), magnetic multilayers, organic layers, various surfaces…..,
Research group:	CF: CEITEC Nano

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