MSDS

1. Etchants and other

2. Process chemicals

3. Resists

4. Precursors

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Acetic acid - cz
Amonnium chloride - cz
Amonnium hydroxide - cz
BOE 7.1
Chloroform - cz
Chrome Etchant
Ethanol - cz
Hydrochloric acid - cz
Hydrofluoric acid - cz
Hydrogen peroxide - cz
Methanol - cz
Nitric acid - cz
Potassium hydroxide - cz
Sodium chloride - cz
Sulfuric acid - cz
TCE (Trichloroethylene) - cz
Orthophosphoric acid
Sodium hydroxide

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Acetone - cz
AR 300-12 PGMEA
AR 300-40 developer series (TMAH)
AR 300-70 NEP
AR 300-73 TMAH
AR 300-76 DMG
AR 300-80 diphenylsilanediol
AR 600-02 anisole
AR 600-07 1-methoxy-2-propanol
AR 600-09 ethyllactate
AR-600-50/2
AR 600-56 MIBK.IPA
AR 600-71 dioxolane
AR 600-546 amylacetate
AZ 726 MIF (TMAH) developer
AZ EBR Solvent PGMEA
DMSO - cz
HMDS - cz
IPA - cz
MIBK - cz
NMP - cz
PG Remover
TMAH pentahydrate - cz
trans-1,2-Dichloroethylene
Boron tribromide
Phosphorus(V) oxychloride
Xylene

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Optical resists

AR-P 3540 - positive
AR-N 4340 - negative
AZ 5214 - expired
AZ 1518 - expired
AZ 9260 – expired
AR-BR 5460 - bottom resist for two-layer lift-off

E-beam resists

AR-P 639.04 - positive PMMA 50K
AR-P 669.04 - positive PMMA 600K
AR-P 679.04 - positive PMMA 950K
AR-P 672.11 - positive PMMA 950K
AR-P 6200.09 - positive CSAR
AR-P 6200.13 - positive CSAR
AR-P 617.04 - positive PMMA + MMA
AR-P 617.08 - positive PMMA + MMA
AR-P 7400.23 - e-beam resist for mix & match, positive or negative
AR-N 7520.17 - negative for mix & match
XR-1541-002 - negative HSQ

AR-PC 5090.02 - protective coating for PMMA, CSAR, HSQ, ...
AR-PC 5091.02 - protective coating for novolak e-beam resists
AR-P 300.80 - adhesion promoter

MOCVD - DOWNLOAD LINK

Ba(TMHD)₂
Iron(III) acetylacetonate
Titanium isopropoxide
Zirconocene dichloride

ALD - DOWNLOAD LINK

Trimethylaluminium (TMA) Tetrakis(Dimethylamido)
Hafnium(Hf(NMe2)4) Tetrakis(Dimethylamido)Titanium (Ti(NMe2)4) Tris(dimethylamino)silane
(TDMASi), [(CH3)2N]3SiH
TEOS

FIB/GIS - DOWNLOAD LINK

Dicobalt octacarbonyl