+420 54114 9207 | 
nano@ceitec.vutbr.cz
1. Self-service users
The preferred way of using the equipment at CEITEC Nano Research Infrastructure for academic users is self-service open access. The instrument running cost is 100% covered by CEITEC Nano, only the administration and training fee is paid by the user.
| Access to all CEITEC Nano equipment via booking system | CZK (without VAT) | EUR (without VAT) |
| User fee for new and regular users | 30,000/year | 1,154/year |
Self-service users gain full independent access to all CEITEC Nano labs and access to all instruments via the booking system. Authorization to work on individual instruments is required and can be obtained after proper training.
1. Register via Perun website – https://idm.ics.muni.cz/ceitec/registrar/?vo=ceitec&group=CEITECNANO
(it takes about 15min to be able to login with your new user account)
2. Print the CEITEC Nano User fee agreement & Solemn declaration and sign it. If you have a faculty advisor and/or sponsor have them sign it as well. Bring the agreement to the user office or scan and email it to nano@ceitec.vutbr.cz.
3. Thoroughly study the CEITEC Nano User Manual, then pass the exam (see Trainings->General trainings).
4. Contact the CEITEC Nano User Office to schedule a laboratory safety excursion. The CEITEC Nano User Office can be reached via email nano@ceitec.vutbr.cz or by phone 54114 9206.
5. After you have completed all of the access requirements, you can start with the training for individual equipment.
For occasional users, where training is unfeasible, full-service processing of user’s samples can be provided by CEITEC Nano staff. Full-service users do not need any training, their samples are handled by CEITEC Nano staff. They can be present at the measurement only as visitors under the supervision of authorized personnel.
Valid from 1st May 2018
Academic users using the full-service pay hourly rates (listed below - VAT is not included) for the instrument use and an additional fee for the analysis of the results (if requested).
CEITEC Nano pricelist* - full service for Academic users | |||
|---|---|---|---|
Nanofabrication laboratory | |||
Lihography | CZK/hour | EUR/hour | |
| RAITH | E-beam writer RAITH150 Two | 1 500 | 58 |
| MIRA | Scanning Electron Microscope/E-beam writer TESCAN MIRA3 | 1 000 | 38 |
| DWL | UV Direct Write Laser system Heidelberg Instruments DWL 66-fs | 1 000 | 38 |
| SUSS-MA8 | Mask Aligner, NanoImprint Lithography SÜSS MicroTec MA8/BA8 Gen3 | 1 000 | 38 |
| SUSS-WETBENCH | Lithographic wetbench for resist coating SÜSS MicroTec | 1 000 | 38 |
| SUSS-RC8 | Resist coating and development system SÜSS MicroTec RCD8 | 1 000 | 38 |
| LAURELL | Spincoater Laurell WS-650-23B | 600 | 23 |
| NANOCALC | Spectroscopic reflectometer Ocean Optics NanoCalc 2000 | 600 | 23 |
| DEKTAK | Mechanical profilometer Bruker Dektak XT | 1 000 | 38 |
| DIENER | Resist stripper Diener electronic NANO Plasma cleaner | 1 000 | 38 |
Depositions and etching | CZK/hour | EUR/hour | |
| EVAPORATOR | Electron beam evaporator BESTEC | 1 000** | 38** |
| MAGNETRON | Magnetron sputtering systém BESTEC | 1 000** | 38** |
| ALD | Atomic layer deposition system Ultratech/CambridgeNanoTech Fiji 200 | 1 000 | 38 |
| XERION | Rapid thermal annealing Xerion XREACT/1 250°C | 600 | 23 |
| PECVD-NANOFAB | High temperature PECVD of C-based materials Oxford Instruments Plasma Technology NanoFab | 1 000 | 38 |
| Experimental-PECVD | PECVD with ion and mass analyzer, optical emission spectroscopy, in situ ellipsometry, langmuir probe | 1 000 | 38 |
| APCVD | Atmospheric Pressure chemical vapor deposition | 1 000 | 38 |
| LPCVD | Low pressure chemical vapor deposition | 1 000 | 38 |
| MOCVD | Metal organic chemical vapor deposition | 1 000 | 38 |
| PECVD | PECVD of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 | 1 000 | 38 |
| DRIE | Deep reactive ion etching of Si-based materials Oxford Instruments Plasma Technology PlasmaPro 100 | 1 000 | 38 |
| SCIA | Ion beam etching Scia Systems Coat 200 | 1 000 | 38 |
| RIE-CHLORINE | Reactive ion etching of III-V semiconductors Oxford Instruments Plasma Technology PlasmaPro 100 | 1 000 | 38 |
| RIE-FLUORINE | RIE of Si-based materials/deposition of thin films Oxford Instruments PlasmaPro NGP 80 | 1 000 | 38 |
Packaging | CZK/hour | EUR/hour | |
| WIRE-BONDER | Wire bonder TPT HB 16 | 600 | 23 |
| LASER-DICER | Laser dicer Oxford Lasers A-Series | 600 | 23 |
Nanocharacterization laboratory | |||
UHV Technologies | CZK/hour | EUR/hour | |
| SIMS | Secondary Ion Mass Spectroscopy ION-TOF TOF.SIMS5 | 1 500 | 58 |
| KRATOS-XPS | X-ray Photoelectron Spectroscopy Kratos Analytical Axis Supra | 1 500 | 58 |
| NANOSAM | nanoScanning Auger Microscopy Scienta Omicron nanoSAM Lab | 1 500 | 58 |
| UHV-CLUSTER | Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS | 1 500 | 58 |
Microscopy and nanomanipulation | CZK/hour | EUR/hour | |
| LYRA | Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3 | 1 000 | 38 |
| ICON-SPM | Scanning Probe Microscope Bruker Dimension Icon | 1 000 | 38 |
| KERR-MICROSCOPE | Magneto-optical Kerr microscope | 600 | 23 |
| NANOINDENTOR | Hysitron TI 950 | 1 000 | 38 |
Optical measurements | CZK/hour | EUR/hour | |
| FTIR | Vacuum FTIR Vertex80v + microscope Hyperion 3000 KIT | 1 000 | 38 |
| WOOLLAM-VIS | NIR-UV spectroscopic ellipsometer J. A. Woollam V-VASE | 600 | 23 |
| WOOLLAM-MIR | MIR spectroscopic ellipsometer J. A. Woollam IR-VASE | 1 000 | 38 |
| VUVAS | Vacuum ultraviolet spectrometer McPherson VUVAS 1000 | 1 000 | 38 |
| NIRQUEST512 | NIR Optical Spectrometer Ocean Optics NIRQuest 512 | 600 | 23 |
| JAZ3 | UV-VIS Optical Spectrometer Ocean Optics JAZ 3-channel | 600 | 23 |
| SNOM-NANONICS | Scanning Near-field Optical Microscopy Nanonics Imaging MV 4000 | 1 000 | 38 |
| TERS | Scanning Probe Microscope + microRaman + PhotoLuminiscence system NT-MDT Ntegra Spectra + Solar II | 1 000 | 38 |
Electrical and magnetic measurements | CZK/hour | EUR/hour | |
| SUMMIT | Semi-automated 4-probe system Cascade Microtech SUMMIT 12000 | 1 000 | 38 |
| MPS150 | 4-probe station Cascade Microtech MPS 150 | 600 | 23 |
| KEITHLEY | Keithley 4200-SCS Parameter Analyzer | 600 | 23 |
| LAKESHORE | Low Temperature Electro-Magnetic Properties Measurement System LakeShore CRX-EM-HF | 1 000 | 38 |
| CRYOGENIC | Low Temperature Vibrating Sample Magnetometr Cryogenic Limited | 1 000 | 38 |
Structural analysis laboratory | |||
Electron microscopy | CZK/hour | EUR/hour | |
| TITAN | High resolution (scanning) Transmission Electron Microscope FEI Titan Themis 60-300 cubed | 2 000 | 77 |
| HELIOS | Focused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 660 | 1 500 | 58 |
| VERIOS | High resolution Scanning Electron Microscope FEI Verios 460L | 1 500 | 58 |
Sample preparation | CZK/hour | EUR/hour | |
| STEMI | Stereomicroscope Zeiss Stemi 508 | 600 | 23 |
| TENUPOL | TEM electrolytical polisher Tenupol 5 | 600 | 23 |
| FISCHIONE-160 | TEM specimen grinding tool Fischione 160 | 600 | 23 |
| FISCHIONE-170 | Ultrasonic TEM disc cutter Fischione 170 | 600 | 23 |
| CITOVAC | Vacuum impregnation chamber Citovac | 600 | 23 |
| LEICACOAT-STAN | Coater Leica EM ACE600 | 600 | 23 |
| TIC3X | Cross section/broad beam ion polisher Leica EM TIC3X | 600 | 23 |
| FISCHIONE-200 | Dimple grinder Fichione 200 | 600 | 23 |
| LECTROPOL | Electrolytical polisher Lectropol 5 | 600 | 23 |
| TEGRAMIN | Grinder/polisher Tegramin 30 | 600 | 23 |
| ZEISS-Z1M | Inverted light microscope Zeiss Axio Observer Z1m | 600 | 23 |
| FISCHIONE-TEM MILL | Ion polisher Fischione TEM Mill 1050 | 600 | 23 |
| LABOTOM5 | Metallographic saw Labotom 5 | 600 | 23 |
| CITOPRESS | Mounting press Citopress 10 | 600 | 23 |
| PLASMACLEANER | Plasma cleaner Fischione 1020 | 600 | 23 |
| SAW-ACCUTOM | Precision saw Accutom 100 | 600 | 23 |
| LEICACOAT-NANO | High vacuum coating system for electron microscopy Leica Microsystems EM ACE 600 | 600 | 23 |
X-ray diffractometry | CZK/hour | EUR/hour | |
| RIGAKU9 | X-ray diffractometer with high brightness source Rigaku SmartLab 9kW | 1 000 | 38 |
| RIGAKU3 | X-ray powder diffractometer Rigaku SmartLab 3kW | 1 000 | 38 |
Micro & Nano X-ray CT laboratory | CZK/hour | EUR/hour | |
| microCT | microCT GE phoenix v|tome|x L240 | 3 000 | 115 |
| nanoCT | nanoCT Rigaku nano3DX | 2 112 | 81 |
Laser Spectroscopy laboratory | CZK/hour | EUR/hour | |
| LIBS | Laser-Induced Breakdown Spectroscopy | 2 000 | 77 |
* Prices without VAT
** Au/Pt – 20 CZK/nm (EVAPORATOR, MAGNETRON)
Prices in EUR are approximate at the rate of 26 CZK = 1 EUR
